10 µm process


The 10 μm process is the level of MOSFET semiconductor process technology that was commercially reached around 1971, by leading semiconductor companies such as RCA and Intel.
In 1960, Egyptian engineer Mohamed M. Atalla and Korean engineer Dawon Kahng, while working at Bell Labs, demonstrated the first MOSFET transistors with 20μm and then 10μm gate lengths. In 1969, Intel introduced the 1101 MOS SRAM chip with a 12μm process.

Products featuring 10 μm manufacturing process