180 nm process
The 180 nm process refers to the level of MOSFET semiconductor process technology that was commercialized around the 1998–2000 timeframe by leading semiconductor companies, starting with TSMC and Fujitsu, then followed by Sony, Toshiba, Intel, AMD, Texas Instruments and IBM.
The origin of the 180 nm value is historical, as it reflects a trend of 70% scaling every 2–3 years. The naming is formally determined by the International Technology Roadmap for Semiconductors.
Some of the first CPUs manufactured with this process include Intel Coppermine family of Pentium III processors. This was the first technology using a gate length shorter than that of light used for lithography.
Some more recent microprocessors and microcontrollers are using this technology because it is typically low cost and does not require upgrading of existing equipment.History
In 1988, an IBM research team led by Iranian engineer Bijan Davari fabricated a 180nm dual-gate MOSFET using a CMOS process. The 180nm CMOS process was later commercialized by Taiwan Semiconductor Manufacturing Company in 1998, and then Fujitsu in 1999.Processors using 180 nm manufacturing technology
