Metal assisted chemical etching
Metal Assisted Chemical Etching is the process of wet chemical etching of semiconductors with the use of a metal catalyst, usually deposited on the surface of a semiconductor in the form of a thin film. Both noble metals such as gold, platinum, palladium, and silver and base metals such as iron, nickel, and copper can act as a catalyst in the process.Metal assisted chemical etching allows for the production of porous silicon with photoluminescence.is silicon with a modified surface and is a type of porous silicon. There are several works on obtaining black silicon using MACE technology. The main application of black silicon is solar energy.
